A complex multi-mode plasma surface treatment installation relates to a plasma surface treatment installation which aims at the problem that when work pieces are processed via a complex surface treatment process, the work pieces need to be processed via different processes on two different devices, and the work pieces in the middle procedure are exposed to the air, forming disadvantageous foreign matters, which affects the property of final films. A magnetron sputtering target (4), vacuum cathodic arc source (14), metal ion implantation source (11), low-energy ion source (5) and a pump set (13) are fixedly installed on the outer wall of a vacuum chamber (1) inside which a radio frequency antenna (6) is fixedly installed, the upper end of a center electrode (9) passes through a sealed insulator (8) to be installed inside the vacuum chamber (1), the lower end of the center electrode is connected with a pulsed bias power supply (10), a high voltage target table (7) is fixed on the center electrode (9), and an upper cover (2) of the vacuum chamber is connected with a pneumatic device (12). The invention employs multiple generating means of particles, the work pieces can obtain thicker films as well as a variety of thicker films, thereby increasing the film-substrate cohesion and realizing the surface treatment of special shaped work pieces and the recombination of pluralities of processes.