利索-全球专利检索

  1. 登录
  2. 注册
发明授权
CN101339895B 一种气体分配装置及应用该分配装置的等离子体处理设备 有权

一种气体分配装置及应用该分配装置的等离子体处理设备
摘要：
本发明公开了一种气体分配装置，其包括支撑板、阻流板和喷淋头电极，所述支撑板上设置有进气通道，喷淋头电极上开设有排气通道。支撑板的背面设置有第一支撑台以及支撑板导流凸台，导流凸台之间的部分以及第一支撑台与导流凸台之间的部分形成导流沟槽；阻流板的正面设置第二支撑台，以将支撑板与阻流板叠置在一起，同时使来自进气通道的气体能够借助于导流沟槽而传递和扩散；以及在阻流板上设置阻流板通孔，以便将来自导流沟槽的气体传递到喷淋头电极的上方，并借助于所述排气通道而将所述气体排出到反应腔室内。本发明还公开一种等离子体处理设备。本发明具有能够均匀地分配气体，且结构简单、成本低、并便于加工、方便维护和不易损坏等优点。
摘要（英）：

The invention discloses a device used for distributing gases, comprising a support plate, a baffle and a spray header electrode; the support plate is provided with an air inlet passage, and the sprayheader electrode is provided with an exhaust passage. The back of the support plate is provided with a first support table and stream guiding bosses of the support plate, and stream guiding grooves are formed among the stream guiding bosses as well as between the first support table and the stream guiding bosses; the front surface of the baffle is provided with a second support table to superposethe support plate and the baffle together, at the same time, the gas coming from the air inlet passage can be transferred and spread by the stream guiding grooves; through holes of the baffle are arranged on the baffle to lead the gas coming from the stream guiding grooves to be transferred above the spray header electrode, and the gas can be discharged out into a reaction chamber by the exhaust passage. The invention also discloses a plasma treatment device. The device of the invention can evenly distribute the gases, and has the advantages of simple structure, low cost, being convenient forprocessing and maintaining, as well as being not easy to be damaged.

公开/授权文献
0/0