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发明授权
CN101430508B 为浸没光刻提供流体的装置和方法 失效 - 权利终止

为浸没光刻提供流体的装置和方法
摘要：
本发明的实施例是针对控制流体流量和压力以便为浸没光刻提供稳定条件的系统和方法。在浸没光刻过程期间，向透镜(22)和基片(16)之间的一空间(34)提供一流体。流体被供给到所说空间，并通过一个与所说空间流体连通的一个多孔元件(51)从所说空间回收流体。把多孔元件中的压力保持在多孔元件的起泡点以下，就能消除在流体回收期间由空气与流体相混合所产生的噪音。在一个实施例中，所说的方法包括：通过一个多孔元件经由一回收流体线路从所说空间抽吸流体；在从所说空间抽吸流体期间，把多孔元件中的流体压力保持在多孔元件的起泡点以下。
摘要（英）：

Embodiments of the present invention are directed to a system and a method of controlling the fluid flow and pressure to provide stable conditions for immersion lithography. A fluid is provided in a space between the lens and the substrate during the immersion lithography process. Fluid is supplied to the space and is recovered from the space through a porous member in fluidic communication with the space. Maintaining the pressure in the porous member under the bubble point of the porous member can eliminate noise created by mixing air with the fluid during fluid recovery. In one embodiment, the method comprises drawing the fluid from the space via a recovery flow line through a porous member; and maintaining a pressure of the fluid in the porous member below a bubble point of the porous member during drawing of the fluid from the space.

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