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发明授权
CN101440484B 感应耦合等离子体处理装置和等离子体处理方法 有权

感应耦合等离子体处理装置和等离子体处理方法
摘要：
本发明提供一种感应耦合等离子体处理装置和等离子体处理方法，该感应耦合等离子体处理装置能够不提高装置成本和电力成本地在等离子体处理的过程中进行等离子体状态的控制。在处理室(4)的上方，隔着电介质壁(2)配置有通过被供给高频电力在处理室(4)内形成感应电场的高频天线(13)，通过等离子体发光状态检测部(40)检测通过感应电场在所述处理室内形成的感应耦合等离子体的发光状态，根据该等离子体发光状态检测部(40)的检测信息，控制单元(50)控制调节包括高频天线的天线电路的特性的调节单元(21)，由此控制等离子体状态。
摘要（英）：

The invention claims an inductively coupled plasma processing unit and a plasma processing method, where the inductively coupled plasma processing unit can control plasma state during a plasma processing period, free of increasing unit cost or electric power cost. An HF antenna (13) supplied HF electric power so as to form an induction filed in a processing chamber (4) is configured isolated froma dielectric wall (2) above the processing chamber (4). A light emitting state of the inductively coupled plasma formed in the processing chamber through the induction field is detected by means of aplasma light emitting state detection portion (40). According to the detection information of the plasma light emitting state detection portion (40), a control unit (50) controls a regulation unit (21) that regulates properties of antenna circuits including the HF antenna, to thereby control the plasma state.

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