The present invention relates to a method for determining exposure settings, a lithographic exposure apparatus, a computer program and a data carrier. The method for determining the exposure setting of the target area on a substrate in a lithographic exposure process comprises the following steps: determining the position of the calibration region in a first direction in a plurality of calibrationpositions through a second direction and a third direction relatively to the position of the calibration region, and providing the standard data. The method also comprises providing the manufacturingdata: establishing a position on the substrate of the target area along the second direction and the third direction; and measuring the position of the exposure area in the first direction on at least one measuring position relatively to the position of the exposure area along the second direction and the third direction. The method further comprises comparing at least one relative measuring position with a plurality of relative calibration positions, and determining the exposure setting based on the measured position and the calibration data of the exposure region in the first direction through comparing, wherein the calibration data relates to at least one relative calibration position which is different from at least one relative measuring position.