利索-全球专利检索

  1. 登录
  2. 注册
发明授权
CN101636695B 微光刻投射曝光设备的照明系统 失效 - 权利终止

微光刻投射曝光设备的照明系统
摘要：
一种微光刻投射曝光设备的照明系统，包括至少一个透射滤波器(66；166；266；366；466；566；666；666’；766，766’；866，866’)，其在至少两个位置处具有不同的透射率以及其布置于光瞳平面(42，60)与场平面(52、58)之间。确定所述透射率分布，使得其对椭圆率具有场依赖性的校正效应。在某些实施例中，远心性和/或辐照均匀性不被该校正影响。
摘要（英）：

An illumination system of a microlithographic projection exposure apparatus comprises at least one transmission filter (66; 166; 266; 366; 466; 566; 666; 666'; 766, 766'; 866, 866') which has a different transmittance at least at two positions and which is arranged between a pupil plane (42, 60) and a field plane (52, 58). The transmittance distribution is determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.

公开/授权文献
0/0