The invention relates to a fully-plastic high-speed manipulator used for a semiconductor etching and cleaning device, belonging to the technical field of mechanism. The fully-plastic high-speed manipulator adopts a full-automatic single shaft mode, and a design scheme comprising a special transferred matter horizontal maintaining mechanism and a full corrosion resisting plastic mechanism; and a power supply and an execution mechanism are arranged in partitioned manner, so the fully-plastic high-speed manipulator for a semiconductor etching and cleaning device is a harmonic and uniform manipulator having the advantages of high-speed operation, stable conveyance, no metallic ion pollution, no particulate pollution, corrosion prevention, and the like.