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发明公开
CN101738857A 黑光阻及其制备方法和构图方法 无效 - 驳回

黑光阻及其制备方法和构图方法
摘要：
本发明涉及黑光阻及其制备方法和构图方法。黑光阻包括：重量百分比为5％～45％的黑颜料、重量百分比为0.5％～67％的分散剂、重量百分比为0％～5％的助分散剂、重量百分比为0.05％～30％的分散树脂、重量百分比为0.05％～30％的碱可溶性树脂、重量百分比为2％～22％的乙烯性不饱和单体、重量百分比为0.05％～10％的环氧树脂、重量百分比为25％～80％的有机溶剂、重量百分比为0.15％～10％的光引发剂、和重量百分比为0.01％～2％的添加剂。本发明黑光阻粒度小，粒度分布范围窄，具有较高的存储稳定性；可满足滤光片黑矩阵的选材要求，有利于提高包括该滤光片黑矩阵显示产品的显示品质。
摘要（英）：

The invention relates to a black photo resist and a preparation method and a picture composition method thereof. The black photo resist comprises 5 to 45 weight percent of black pigment, 0.5 to 67 weight percent of dispersing agent, 0 to 5 weight percent of auxiliary dispersing agent, 0.05 to 30 weight percent of dispersion resin, 0.05 to 30 weight percent of alkaline soluble resin, 2 to 22 weight percent of unsaturated vinyl monomer, 0.05 to 10 weight percent of epoxy resin, 25 to 80 weight percent of organic solvent, 0.15 to 10 weight percent of photoinitiator and 0.01 to 2 weight percent of additive. The black photo resist has the advantages of small granularity, narrow particle size distribution range and high storage stability, can meet the requirement of material selection of a black matrix of an optical filter, and is favorable for improving the display quality of display products comprising the black matrix of the optical filter.

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