A metal optical grayscale mask includes a layer of metal film which is deposited on the transparent substrate, and different transparency pattern which is formed by laser writing on the surface of the metal film. The pattern is continuous, in type of array or random pattern. The grayscale is within 3.0-0.05D. The thickness of the metal film is 5-100 nm. A manufacturing method of the metal opticalgrayscale mask includes that the selected transparent substrate is rinsed by the general semiconductor rinse process, the metal film is deposited on the transparent substrate then different transparency pattern is formed by laser writing on the surface of the metal film. The pattern is continuous, in type of array or the random pattern. The grayscale mask is low in price, antistatic electricity performance is good, the resolution can surpass optical diffraction limit. The manufacturing method is simple. There is a wide band application for micro-optical components and large-scale production of micro-electro-mechanical systems.