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发明授权
CN101990652B 用于光刻设备的剪切层卡盘 有权

用于光刻设备的剪切层卡盘
摘要：
本发明公开了一种光刻设备，其包括支撑结构(300)用以保持物体(210)。物体可以是图案形成装置或将要曝光的衬底。支撑结构包括卡盘(321)，物体支撑在卡盘上，并且剪切柔性的细长元件(325)的阵列与卡盘和台(230)正交，使得细长元件的第一端接触卡盘的表面，细长元件的第二端接触台。通过使用细长元件的阵列，使得台和卡盘之间的应力的传递是基本上均匀的，这导致在由于应力带来的卡盘的变形期间物体相对于卡盘的表面的滑动最小。
摘要（英）：

A lithographic apparatus is described that comprises a support structure (300) to hold an object (210). The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck (321), on which the object is supported, and an array of shear- compliant elongated elements (325) normal to the chuck and the stage (230), such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.

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