The invention relates to a method for compensating deformation effect after exposure of a two-dimensional design layout. The method comprises the following steps of: establishing the two-dimensional design layout, and setting a key size edge placement error to be compensated; selecting a point on the design layout as a first sampling point, and then selecting sampling points at predetermined intervals from the first sampling point to partition the design layout; performing corrosion and simulation by using optical approaching correction technology to acquire edge placement errors of the points; and establishing a standard optical approaching correction model, and selecting the acquired point, the edge placement error of which is closest to the key size edge placement error, as a calculation point of the compensated edge placement error. The method saves repair of a design layout checking routine, greatly reduces time consumption, shortens the correction period, reduces the workload, and improves the accuracy.