The invention belongs to the technical field of nanoprocessing and in particular relates to a method for preparing a patterned zinc oxide nanofilm by a nanoimprint technology. The method mainly comprises the following steps of: preparing a colloidal ball template; preparing a polydimethylsiloxane negative type structure soft template; preparing zinc oxide precursor sol; and preparing the patterned zinc oxide film by the nanoimprint technology. In the method, the templates required by nanoimprint are assembled by a self-assembling technology; the zinc oxide precursor sol serves as a barrier layer; and nanoimprint process parameters are controlled, so that the sol is converted into gel in the impressing process and the patterned zinc oxide film is directly impressed without subsequent etching process. The method is high in repeatability. By the method, the patterned oxide films can be prepared on a large scale and under the conditions of high efficiency and low price.