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发明公开
CN102436150A 曝光装置及曝光方法 无效 - 驳回 复审申请

曝光装置及曝光方法
摘要：
本发明提供一种曝光装置及曝光方法。所述方法包括：利用曝光光源来提供光线至所述光阻层；以及利用反射板来将穿过所述光阻层及所述透光基板的光线反射回所述光阻层。本发明可缩小光阻层图案的线距。
摘要（英）：

The invention provides an exposure device and an exposure method. The method comprises the following steps of: providing light to a light resistance layer by use of an exposure light source; and reflecting the light passing through the light resistance layer and a light transmitting substrate back to the light resistance layer by use of a reflection plate. According to the invention, the linear distance of patterns of the light resistance layer can be reduced.

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