The invention relates to a non-destructive and pollution-free graphical method for a nano-carbon film, and belongs to the field of preparation of electronic devices. The method includes the steps: firstly, preparing a single-layer or double-layer metal or metal-supported ceramic film graphic on a base material; secondly, depositing the nano-carbon film on the preliminarily graphical base material; and finally, removing a prefabricated single-layer metal graphic by means of wet etching, directly stripping the nano-carbon film attached on the surface of the base material, or simultaneously stripping the supported metal or ceramic film and removing nano-carbon materials attached on the surface of the prefabricated graphic by etching underlying metal, keeping a film directly contacting with the base material to form a corresponding graphic and accordingly realizing the graphical nano-carbon film. As the carbon film does not directly contact with photoresist and plasma in the process, pollution and damage to the prepared graphic are avoided. The graphical carbon film can be used for a transparent electrode of a display, a thin-film field effect transistor and the like.