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发明公开
CN103113827A 用于光蚀刻法的组合物和防反射涂层 失效 - 权利终止

用于光蚀刻法的组合物和防反射涂层
摘要：
本发明提供一种组合物，其包括至少以下的A和B:A)含有以下结构单元1的聚合物，其中L是CX-CYZ，其中X，Y，和Z各自独立地选自氢，烷基，或者取代的烷基；和M是亚烷基，亚芳基，取代的亚烷基，取代的亚芳基，或者C(O)O-W-，其中W是亚烷基或者取代的亚烷基；和R’，R”，和R”’各自独立地选自芳族烃，脂族烃，或者取代的烃，其包括O，N，S，或者Si原子中的一个或者多个，条件是R’，R”，和R”’中的至少一个选自烷氧基，芳氧基，羟基，卤素，羧基，或者碳酸酯；和p是1至10,000的整数；和条件是该聚合物不包括多面体低聚倍半硅氧烷(POSS)结构；和B)由第一组合物形成的聚合物，所述第一组合物包括本申请中所述的化合物F1，化合物F2，化合物F3和/或化合物F4中的至少一种。
摘要（英）：

The invention provides a composition comprising at least the following A and B: A) polymer that comprises the following structural unit 1: wherein L is CX-CYZ, where X, Y, and Z are each independently selected from hydrogen, an alkyl, or a substituted alkyl; and, M is an alkylene, an arylene, a substituted alkylene, a substituted arylene, or C(O)O-W-, where W is an alkylene or a substituted alkylene; and R', R'', and R''' are each independently selected from an aromatic hydrocarbon, an aliphatic hydrocarbon, or a substituted hydrocarbon that comprises one or more of O, N, S, or Si atoms, provided that at least one of R', R'', and R''' is selected from alkoxyl, aryloxyl, hydroxyl, halide, carboxyl, or carbonate; and, p is an integer from 1 to 10,000; and with the proviso that the polymer does not comprise a polyhedral oligomeric silsesquioxane (POSS) structure; and B) a polymer formed from a first composition comprising at least one of Compound F1, Compound F2, Compound F3 and/or Compound F4, each as described herein.

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