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发明公开
CN103217872A 光刻机用微透镜阵列的检测装置和检测方法 有权 转让

光刻机用微透镜阵列的检测装置和检测方法
摘要：
一种光刻机用微透镜阵列的检测装置和检测方法，检测装置的过程包括准分子激光器，沿该准分子激光器的输出光束方向依次是同轴的扩束镜、能量衰减片、光阑、聚光镜和图像传感器，所述的微透镜阵列置于二维电动平台上，所述的微透镜阵列的后焦面与所述的聚光镜的前焦面重合；所述的图像传感器位于所述的聚光镜的后焦面，所述的图像传感器的输出端与计算机的输入端相连。本发明可以精确测量光刻机照明系统中微透镜阵列的不均匀性和能量利用率，可以完整的获得全口径微透镜形成的远场光斑图像。
摘要（英）：

The invention discloses a detection device and a detection method of a micro-lens array for a photoetching machine. The detection device comprises an excimer laser, and a beam expanding leans, an energy attenuation plate, a diaphragm, a collecting lens and an image sensor which are coaxial are orderly arranged in the beam outputting direction of the excimer laser, the micro-lens array is arranged on a two-dimensional electric platform, the rear focal plane of the micro-lens array is overlapped with the front focal plane of the collecting lens, an image sensor is arranged on the rear focal plane of the collecting lens, and the output end of the image sensor is connected with the input end of a computer. The non-uniformity and the energy utilization rate of the micro-lens array in the photoetching machine lighting system can be precisely measured, and a far field facula image formed by a full-aperture micro-lens can be completely obtained.

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