The invention provides an exposure system and an exposure method. The exposure system comprises a light-emitting panel, a driving module, a first lens and a filter lens, wherein the light-emitting panel comprises a plurality of light-emitting units which are arranged in matrix manner; each light-emitting unit comprises a light-emitting layer; the driving module is used for driving the light-emitting units in a light-emitting area of the light-emitting panel to emit light; patterns in the light-emitting area and to-be-formed patterns are same in shape; the first lens is used for converting light emitted by the light-emitting panel into parallel light; the filter lens is used for filtering the light passing through the first lens and selecting the light transmitting the wavelength to be exposed. According to the technical scheme, the light-emitting units in different areas are controlled to emit light, so that the exposure of different areas required for manufacturing different patterns is realized; a solid quartz mask plate is omitted; the cost of the photo-etching process is reduced.