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发明公开
CN104407498A 一种处理光罩污染颗粒的方法 无效 - 驳回

一种处理光罩污染颗粒的方法
摘要：
本发明涉及半导体制造技术领域，尤其涉及一种处理光罩污染颗粒的方法，通过在光罩的非曝光区域设置一肉眼可见且易清除的定位颗粒后，使用光罩颗粒检测机检测出该定位颗粒以及待清理颗粒的位置，并计算光罩上的待清理颗粒与定位颗粒的相对距离，根据所述相对距离对所述待处理颗粒进行清理；最后继续对定位颗粒进行清理，从而有效去除了光罩上的污染颗粒，排除了生产上断线的危险，提高了晶圆的良率，降低了由于光罩污染颗粒所引起的生产损失。
摘要（英）：

The invention relates to the technical field of semiconductor manufacturing, in particular to a method for treating a photomask contamination particle. The method comprises the following steps of arranging a macroscopic and easy-to-clean positioning particle in a non-exposed area of a phosomask, detecting the positions of the positioning particle and the particle to be cleaned by using a photomask particle detector, calculating the relative distance between the particle to be cleaned and the positioning particle on the photomask, cleaning the particle to be cleaned according to the relative distance, and continuing cleaning the positioning particle. Therefore, the contamination particle on the photomask is effectively removed, the danger of production interruption is eliminated, the yield of a wafer is improved, and production loss caused by the photomask contamination particle is reduced.

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