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CN104704606B 针对先进元件的晶圆上粒子性能的化学相容性涂层材料 有权

针对先进元件的晶圆上粒子性能的化学相容性涂层材料
摘要：
为了针对一种用于半导体处理腔室的制品制造涂层，该制品包括Al、Al2O3或SiC中的至少一者的主体及主体上的陶瓷涂层。陶瓷涂层包括一化合物，该化合物包含自约50摩尔％至约75摩尔％范围内的Y2O3、自约10摩尔％至约30摩尔％范围内的ZrO2及自约10摩尔％至约30摩尔％范围内的Al2O3，其中每英寸节结的数目处于自约30个节结至约45个节结的范围内且孔隙率处于自约2.5％至约3.2％的范围内。
摘要（英）：

To manufacture a coating for an article for a semiconductor processing chamber, the article including a body of at least one of Al, Al2O3, or SiC, and a ceramic coating on the body. The ceramic coating includes a compound comprising Y2O3 in a range from about 50 mol % to about 75 mol %, ZrO2 in a range from about 10 mol % to about 30 mol %, and Al2O3 in a range from about 10 mol % to about 30 mol %, wherein the number of nodules per inch is in a range from about 30 nodules to about 45 nodules and the porosity is in a range from about 2.5% to about 3.2%.

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