The invention discloses a vacuum dehydroxylation furnace for semiconductor quartz glass products. The furnace comprises a furnace door arranged at one side of the furnace body. A trolley is arranged inside the furnace body. The trolley is fixedly connected with the furnace body. The bottom of the trolley has rollers. A motor is connected with the outside of the trolley. The furnace body has a furnace body bottom opposite to the furnace door. The furnace door and the furnace body bottom are provided with air inlets. Air outlets are respectively arranged above and below the middle part of the furnace body. The furnace door, the furnace door bottom and upper surface, lower surface, front surface and rear surface of the furnace body are respectively provided with a heater. The heater in each direction is individually connected with a temperature controller. According to the invention, the charging difficulty of a large-aperture quartz tube is solved, safety and operability of loading and unloading and charging and discharging are remarkably enhanced, labor intensity and risk are greatly reduced, charging and discharging processes can be finished at a time, repeated turnover problem is avoided, turnover of a material shelf is not required frequently, the operating process is more convenient, and service life is longer.