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发明授权
CN105027274B 用于沉积腔室的基板支撑夹盘冷却 有权

用于沉积腔室的基板支撑夹盘冷却
摘要：
本文提供一种用于基板处理系统中的基板支撑夹盘。在一些实施方式中，用于基板处理腔室中的基板支撑件可包括：静电夹盘，所述静电夹盘具有顶部基板支撑表面与底部表面；以及冷却环组件，所述冷却环组件具有中心开孔，所述冷却环组件设置于所述静电夹盘的底部表面的附近，所述冷却环组件包括：冷却部，所述冷却部具有热耦接至所述静电夹盘的底部表面的顶部表面，所述冷却部具有形成于所述冷却部的底部表面中的冷却通道；以及帽部，所述帽部耦接至所述冷却部的底部表面并且流体地密封形成于所述冷却部中的所述冷却通道。
摘要（英）：

A substrate support chuck for use in a substrate processing system is provided herein. In some embodiments, a substrate support for use in a substrate processing chamber may include an electrostatic chuck having a top substrate support surface and a bottom surface, and a cooling ring assembly having a central opening disposed proximate the bottom surface of the electrostatic chuck, the cooling ring assembly including, a cooling section having a top surface thermally coupled to the bottom surface of the electrostatic chuck, the cooling section having a cooling channel formed in a bottom surface of the cooling section, and a cap coupled to a bottom surface of the cooling section and fluidly sealing the cooling channel formed in the cooling section.

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