The invention provides an exposure base platform and an exposure device. The exposure base platform comprises a base, a plurality of base platform bodies and a plurality of lifting parts, wherein the base platform bodies and the lifting parts are arranged on the base, the base platform bodies and the lifting parts are arranged in a staggered and interval mode, the base platform bodies are used for bearing a base plate to be exposed, and the lifting parts are used for conveying the base plate to be exposed to the base platform bodies. Each base platform body comprises a first structure close to the lifting parts. Each lifting part comprises a second structure located at the end, making contact with the base plate to be exposed, of the lifting part. The first structures and the second structures are matched and can enable exposure light irradiated to an interval area between the base platform bodies and the lifting parts to be irradiated to the first structures. By means of the exposure base platform, the reflection optical path difference of the exposure light irradiated to the interval area between the base platform bodies and the lifting parts can be reduced, and therefore the exposure base platform can expose the base plate to be exposed more uniformly on the area corresponding to the interval area and the area corresponding to the bearing faces of the base platform bodies.