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发明公开
CN105051246A 可变半径的双磁控管 有权

可变半径的双磁控管
摘要：
双磁控管，特别有用于RF等离子体溅射，包括：径向静止开环磁控管(82)，包括相对磁极(90、92)且绕中央轴(14)旋转以扫描溅射目标(20)的外部区域；和径向可移动式开环磁控管(84)，包括相对磁极(96、98)且与该静止磁控管一起旋转。在处理期间(图2)，该可移动式磁控管以开口端邻接于该静止磁控管的开口端径向地放置于外部区域中，以形成单一开环磁控管。在清理期间(图3)，该可移动式磁控管的部分径向地向内移动以扫描及清理目标未被该静止磁控管扫描的内部区域。该可移动式磁控管可装设于臂(114)上，该臂于旋转碟状平板(100)的周边处绕轴(118)转动，该静止磁控管装设于该碟状平板，使得该臂离心地根据旋转速率或方向在径向位置间移动。
摘要（英）：

A dual magnetron particularly useful for RF plasma sputtering includes a radially stationary open-loop magnetron (82) comprising opposed magnetic poles (90, 92) and rotating about a central axis (14) to scan an outer region of a sputter target (20) and a radially movable open-loop magnetron (84) comprising opposed magnetic poles (96, 98) and rotating together with the stationary magnetron. During processing (FIG. 2), the movable magnetron is radially positioned in the outer region with an open end abutting an open end of the stationary magnetron to form a single open-loop magnetron. During cleaning (FIG. 3), part of the movable magnetron is moved radially inwardly to scan and clean an inner region of the target not scanned by the stationary magnetron. The movable magnetron can be mounted on an arm (114) pivoting about an axis (118) at periphery of a rotating disk-shaped plate (100) mounting the stationary magnetron so the arm centrifugally moves between radial positions dependent upon the rotation rate or direction.

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