The invention provides a plasma cleaning device which comprises a plurality of plasma generation cylinders. One end of each plasma generation cylinder is provided with a gas inlet, and the other end of each plasma generation cylinder is provided with a gas outlet. Each plasma generation cylinder excites gas inside the plasma generation cylinder to be plasma. The multiple plasma generation cylinders are arranged in an array manner. Holes formed in the lower ends of the plasma generation cylinders are staggered. Plasma input by the plasma cleaning device to the surface of a glass substrate can evenly cover the glass substrate, the dead corners not covered with the plasma are reduced, and therefore the cleaning effect on the glass substrate can be ensured.