The invention provides vacuum evaporation equipment. The vacuum evaporation equipment comprises a vacuum chamber, an evaporation source located in the center area of a bottom board in the vacuum chamber, a substrate and a sleeve installed on the bottom surface of the substrate, wherein the substrate is arranged at the upper portion inside the vacuum chamber and can move in three dimensions. Blocking sheets are evenly arranged at different positions of the sleeve in the height direction. Each blocking sheet is provided with round holes which are evenly distributed. The evaporation source comprises an evaporation tray and evaporating materials in the evaporation tray. An electronic gun is arranged on one side of the evaporation source. Currents in X and Y deflection coils in the electronic gun are controlled to generate electronic beams to realize targeted evaporation of the evaporating materials. Uniform deposition of a nanoscale film is achieved by controlling the evaporation capacity of the evaporating materials in the evaporation tray and the deposition rate of the film on the substrate.