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发明授权
CN105102230B 流体喷射装置 有权

流体喷射装置
摘要：
一种形成流体喷射装置的基底的方法包括：在所述基底中从第二侧面朝第一侧面形成开口；以及将所述基底中的开口进一步形成至第一侧面，包括将开口增大至第一侧面并且在第二侧面处增大开口；以及形成具有在第一侧面和第二侧面中间基本上平行的侧壁和至第一侧面的收敛的侧壁的开口。
摘要（英）：

A method of forming a substrate for a fluid ejection device includes forming an opening in the substrate from a second side toward a first side, and further forming the opening in the substrate to the first side, including increasing the opening to the first side and increasing the opening at the second side, and forming the opening with substantially parallel sidewalls intermediate the first side and the second side and converging sidewalls to the first side.

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