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发明授权
CN105229197B 碳涂层清洗方法及装置 有权

碳涂层清洗方法及装置
摘要：
本发明提供一种碳涂层清洗方法及等离子体CVD装置。等离子体CVD装置(1)具备：对工件(W)或模型工件(W’)两端密封的由绝缘体构成的第一密封部件(2a)或第二密封部件(2b)；阳极(3)；对工件(W)或模型工件(W’)的内部进行减压的减压单元(26)；向工件(W)内部供应原料气的原料气供应单元(6)；脉冲电源(27)和向模型工件(W’)内部供应氧气的氧气供应单元(8)。根据该碳涂层清洗方法及等离子体装置，能够清洗在等离子体CVD装置的各个部分上形成的碳涂层。
摘要（英）：

Provided is a preliminary treatment method for a workpiece capable of shortening a cycle time by preventing a nodule from being formed on a carbon film. The preliminary treatment method for the workpiece is performed before a carbon film is formed on a surface of a workpiece W. A bias voltage is applied to the workpiece W disposed in a treatment space S maintained at a predetermined vacuum degree while an oxygen gas is supplied to the treatment space S before a material gas is supplied to the treatment space S, oxygen plasma is generated along the surface of the workpiece W, and oxygen, hydrogen, or water stuck to the surface of the workpiece W is removed.

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