The invention discloses a nanometer transfer method and a nanometer functional device. The nanometer transfer method comprises the following steps of: S1, coating a flexible metallic substrate with photoresist; S2, photoetching the flexible metallic substrate coated with the photoresist in order to form a trench pattern; S3, performing first-time electroforming in order to form a pattern electrode; S4, performing second-time electroforming in order to form a transfer layer; and S5, by means of a roll-to-flat transfer mode, controlling the flexible metallic substrate to perform transferring on a corresponding substrate so as to form a nanostructure material layer. The method may achieve transfer of nanometer electrodes or nanostructure functional regions with different materials on the same substrate, or transfer of multilayer composite structure nanometer electrodes or functional regions on the same area of the same substrate. The pattern electrode on the metallic substrate is used as a transfer mold. By means of electro-deposition technology, a nanoscale material layer is formed on the electrode of the transfer mold and the nanoscale material layer on the transfer mold is transferred to a corresponding flexible substrate surface.