The invention relates to the thin film preparing technology, in particular to a coating device adopting a scanning type evaporation source and a coating method of the coating device. The device is characterized in that a coating work rest for containing substrates is arranged in a vacuum coating chamber, and the scanning type evaporation source is arranged on the vacuum coating chamber. A crucible in the scanning type evaporation source can move in a fixed-point, timing and scanning manner and performs film material evaporation; the scanning type evaporation source is further provided with a medicine charging cavity chamber relatively independent of the vacuum coating chamber; and adding and preheating of film materials and a coating working procedure of the vacuum coating chamber are separated. The device and method have the beneficial effects that under the condition that a film thickness supplementing and correcting plate is not used, coating thicknesses of all substrates on the work reset meet uniformity requirements, the film material using rate and coating efficiency are improved, and the coating cost is reduced; and the aim that medicine charging, air exhausting and preheating working procedures in the medicine charging cavity chamber and air exhausting and coating working procedures in the vacuum coating chamber are synchronously carried out is achieved, and the production efficiency and the coating quality are improved.