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发明公开
CN105974740A 光刻胶图形成形方法及装置、膜层、基板及制作方法 无效 - 驳回

光刻胶图形成形方法及装置、膜层、基板及制作方法
摘要：
本发明公开了一种光刻胶图形的成形方法、膜层制作方法、基板及其制作方法、显示装置、光刻胶喷涂装置，本发明通过喷涂的方式在薄膜上喷涂光刻胶形成预定形状的图形，可以省去曝光、显影的步骤，简便快捷，同时可以不用涂覆整面的光刻胶，并且避免使用显影液等化学试剂，不会造成光刻胶以及显影剂的浪费，节约了资源，降低了成本。另外本发明不必根据光刻胶的图像更换不同的掩膜版，可以进一步地降低生产成本。
摘要（英）：

The invention discloses a photoresist pattern forming method, a film manufacturing method, a substrate and a manufacturing method thereof, a display device and a photoresist spraying device. According to the invention, patterns in a preset shape are formed by spraying photoresist on a film in a spraying manner, steps of exposing and developing can be omitted, the operation is simple and rapid, the photoresist does not need to be coated on the whole surface, chemical reagents, such as a developing solution, are avoided, waste of the photoresist and developing agents is avoided, resources are saved, and the cost is reduced. In addition, different masks do not need to be replaced according to photoresist images, so that the production cost can be further reduced.

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