The invention discloses a nano-particle atomic layer deposition device and method based on spatial isolation. Nano-particles to be wrapped pass through a pipeline provided with a plurality of electrodes along with airflow, and due to the fact that the nano-particles take the same charge when passing through the electrodes through the point discharge effect, the nano-particles are mutually repulsed and prevented from gathering, and the purpose of dispersing the nano-particles is achieved; and afterwards, the nano-particles are evenly wrapped after passing through a cleaning area or a precursor reaction area. The spatial isolation principle is adopted, different courses of atomic layer deposition are not affected mutually, the nano-particles can be quickly and evenly wrapped at the normal pressure, and the wrapping rate and evenness of deposited films and powder surface wrapping efficiency are improved.