The invention relates to a process for producing coral magnetron-sputtering low-emissivity coated glass. The process is characterized by specifically comprising the following steps: (1) firstly, cleanly washing a glass substrate, and then, feeding the washed glass substrate to a magnetron sputtering processing chamber of magnetron sputtering equipment; (2) coating a first-layer film, and carrying out magnetron-sputtering SiO2 depositing by using an intermediate-frequency power supply and a rotating cathode according to the thickness of 12nm to 12.6nm, wherein a target material is a silica-alumina material; (3) coating a second-layer film, a third-layer film, a fourth-layer film and a fifth-layer film sequentially, and carrying out magnetron-sputtering Si3N4 depositing by using an intermediate-frequency power supply and a rotating cathode according to the thickness of 11nm to 11.5nm, wherein target materials are all silica-alumina materials; (5) coating a sixth-layer film, and carrying out magnetron-sputtering Cr2N depositing by using a direct-current power supply and a planar cathode according to the thickness of 2.2nm to 4.5nm, wherein a target material is chromium; and (9) coating a thirteenth-layer film, and carrying out magnetron-sputtering Ti depositing by using a direct-current power supply and a planar cathode according to the thickness of 0.7nm to 1.8nm, wherein a target material is titanium.