The invention discloses a nitrogen trifluoride plasma cleaning device which comprises a shell, an electrolytic bin and a thermal contact. An opening is formed in the left side of the shell and fixedly connected with the left end of a shell of a cleaning bin. An opening is formed in the left side of the cleaning bin and in threaded connection with a bin cover. Strip-shaped plate electrodes are bonded to the inner side wall of a cavity of the cleaning bin. Round plate electrodes are bonded to the inner wall of the bottom of the cleaning bin and the inner wall of the bin cover correspondingly. The shell of the cleaning bin is sleeved with a spiral coil. A particle accelerator is connected with the right end of the cleaning bin through a made-to-order arc pipeline. The right end of the cleaning bin is connected with a vacuum pump through a conduit. The vacuum pump is fixedly mounted inside the shell, and connected with a tail gas treatment device through an exhaust pipe. The thermal contact is fixedly connected with an internal support of the cleaning bin. The thermal contact and a calibration block are connected with a voltmeter through wires correspondingly. According to the nitrogen trifluoride plasma cleaning device, nitrogen trifluoride serves as an ion supplying source, cleaning is conducted in a plasma corrosion mode, and circuit boards and components are effectively prevented from being damaged.