The invention relates to a photomask plate cleaning device. The cleaning device comprises a treatment trough body, an air feeding and liquid feeding apparatus at the upper end of the treatment trough body, and draining exhaust pipes at the bottom of the treatment trough body, a center position in the treatment trough body is a photomask plate rotation mechanism at the upper-lower direction, the draining exhaust pipes are uniformly distributed at the circumference of the bottom of the treatment trough body, the air feeding and liquid feeding apparatus is arranged at the top of the treatment trough body, the photomask plate rotation mechanism is positioned at the center of the air feeding and liquid feeding apparatus, the treatment trough body, and the draining exhaust pipe; a plurality of first rectification blades are configured at the upper part of the draining exhaust pipe along the circumference direction of the treatment trough body, the first rectification blades are inclined from the top of the treatment trough to the bottom along the inner wall of the treatment trough body, the first rectification blade is the bending blade with a projection intermediate part; the side wall around the treatment trough is in a bending state with different diameters from upper to lower, and the side wall forms a cylindric shape by taking a revolving axle of a rotation mechanism as a center. The problem that during a cleaning process, the rotation of the photomask plate stops, and phenomenon of water drops on the surface is generated can be solved.