The invention provides etching paste based on a nano-silver conducting film. The etching paste is composed of a SiO2 substrate, an etching agent, polyvinylpyrrolidone, a water-borne dispersoid of a water absorbent and a polyalcohol solvent. The etching paste based on the nano-silver conducting film is mainly characterized in that the water-borne dispersoid of the water absorbent is added, the water absorbent is used as a carrier of water, the etching paste and nano-silver are prevented from reacting under normal temperature conditions and are subjected to a rapid reaction at high temperature, etching speed can be controlled under different high-temperature conditions, and etching conditions are controllable. Besides, paste left after the etching reaction can be quickly removed through washing, the trace of the etching reaction is light, and the nano-silver conducting film material obtained after etching is good in optical homogeneity.