The invention relates to a producing method of a selective emitter double-faced PERC crystalline silicon solar cell. The producing method is characterized by comprising the first step of removing affected layers of a silicon chip and conducting texturization and cleansing on the silicon chip, the second step of conducting diffusion to form a pn junction and eliminating phosphorosilicate glass in positive side of the silicon chip and the pn junction in the reverse side of the silicon chip after the diffusion; the third step of conducting deposition of aluminum oxide/silicon nitride laminated passivated film on the reverse side of the silicon chip and conducting deposition of a silicon nitride antireflection film on the positive side of the silicon chip; the fourth step of using an optical maser to conduct routing on the reverse side of the silicon chip to obtain a routing slot; the fifth step of using a phosphorous source to coat the positive side of the silicon chip; the six step of conducting laser doping on the positive side of the silicon chip to obtain a main guard line and a subsidiary guard line doped with the laser; the seventh step of conducting photoinduction on electronickelling/copper/silver electrode, conducting connections between the reverse side of the cell with a cathode of an external power supply, conducting electroplating on the positive and reverse sides of the cell simultaneously, and conducting electroplating of three metals of nickel/copper/silver in sequence; the eighth step of conducting annealing on the electroplated cell. According to the producing method of the selective emitter double-faced PERC crystalline silicon solar cell, the problem that an aluminum grid line is hard to be aligned with a laser windowing grid when a silk screen is used to conduct reverse printing of the double-faced PERC cell is solved.