The invention provides exposure equipment and an exposure method. The exposure equipment comprises a mask, a first platform, a second platform, a first light source and a second light source, wherein the first platform is arranged at a position below a left side of the mask, the second platform is arranged at a position below a right side of the mask, the first light source is arranged at a position above the right side of the mask, the second light source is arranged at a position above the left side of the mask, the first platform and the second platform are both used for bearing substrates, a light ray emitted from the first light source passes through the mask and irradiates the first platform, and a light ray emitted from the second light source passes through the mask and irradiates the second platform. The exposure equipment is provided with the two light sources, when the exposure equipment is used for exposure, the purpose of simultaneously exposing the two substrates in an exposure cavity by using the mask can be achieved by reasonably arranging an optical path, so that the yield can be improved, and the mask is saved.