The invention discloses a rapid epitaxial wafer exposure device comprising an image locating device. The top part of the image locating device is provided with a digital electronic polarization frame capture structure. An exposure lamp is installed between the digital electronic polarization frame capture structure and the image locating device. The digital electronic polarization frame capture structure and the image locating device are connected through an adjustable device. The bottom part of the image locating device is arranged on an operating platform. The image locating device and the operating platform are hinged. Holders are installed on the position close to the lower surface of the two side surfaces of the operating platform. The holders and the operating platform are fixedly connected. Energy consumption plates are connected between the two holders. There are more than one energy consumption plates which are provided with guide rails. According to the rapid epitaxial wafer exposure device, the braking and intelligent degree of equipment can be enhanced so that the safety coefficient can be greatly enhanced, the exposure accuracy can be enhanced, the line is enabled to be more uniform and the service life of the exposure equipment can also be prolonged, and thus the device has great adjustment performance, simple debugging and convenient operation.