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发明授权
CN106653654B 一种多步骤干法刻蚀机台颗粒监测的方法 有权

一种多步骤干法刻蚀机台颗粒监测的方法
摘要：
本发明公开了一种多步骤干法刻蚀机台颗粒监测的方法，通过在单步骤的颗粒监测方法的基础上增加缩短时间的全步骤的颗粒监测方法，不仅有效的监测了多步骤干法刻蚀机台产生的所有颗粒，并且增加了颗粒有无特殊分布的检查和对大颗粒的规格控制，增强了颗粒监测的灵敏度，减少了产品事故的概率。
摘要（英）：

The invention discloses a particle monitoring method of a multi-step dry method etching machine. By adding a full-step particle monitoring method for shortening time on the basis of a single-step particle monitoring method, all particles generated by the multi-step dry method etching machine are effectively monitored, detection on particular distribution of the particles and specification control on large particles are added, the particle monitoring sensitivity is improved, and the probability of a product accident is reduced.

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