This semiconductor manufacturing apparatus has: a processing container; a partition wall that partitions at least a part of the space in the processing container into a growing section and a cleaning section; a substrate holding member that is disposed in the growing section; a starting material gas supply system that supplies a starting material gas to the inside of the growing section; a cleaning gas supply system that supplies a cleaning gas to the inside of the cleaning section; and a heater that heats the growing section and the cleaning section.