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发明公开
CN106855680A 图案处理方法 无效 - 撤回

图案处理方法
摘要：
图案处理方法包含：(a)提供半导体衬底，所述半导体衬底在其表面上包含图案化特征；(b)将图案处理组合物涂覆到所述图案化特征上，其中所述图案处理组合物包含聚合物，所述聚合物包含用于与所述图案化特征的表面形成键的表面附着基团，及溶剂，并且其中所述图案处理组合物不含交联剂；(c)用第一冲洗剂自所述衬底去除残余图案处理组合物，留下在所述图案化特征的所述表面上方并且结合到所述图案化特征的所述表面的所述聚合物的涂层；及(d)用与所述第一冲洗剂不同的第二冲洗剂冲洗所述经聚合物涂布的图案化特征，其中所述聚合物在所述第一冲洗剂中的溶解性比在所述第二冲洗剂中大。所述方法尤其适用于制造提供高分辨率图案的半导体装置。
摘要（英）：

Pattern treatment methods comprise: (a) providing a semiconductor substrate comprising a patterned feature on a surface thereof; (b) applying a pattern treatment composition to the patterned feature, wherein the pattern treatment composition comprises a polymer comprising a surface attachment group for forming a bond with a surface of the patterned feature and a solvent, and wherein the pattern treatment composition is free of crosslinkers; (c) removing residual pattern treatment composition from the substrate with a first rinse agent, leaving a coating of the polymer over and bonded to the surface of the patterned feature; and (d) rinsing the polymer-coated patterned feature with a second rinse agent that is different from the first rinse agent, wherein the polymer has a solubility that is greater in the first rinse agent than in the second rinse agent. The methods find particular applicability in the manufacture of semiconductor devices for providing high resolution patterns.

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