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发明授权
CN107293511B 一种膜层退火设备及退火方法 有权

一种膜层退火设备及退火方法
摘要：
本发明公开一种膜层退火设备及退火方法，涉及显示技术领域，用于改善显示装置的画面显示质量。所述膜层退火设备包括：承载台，用于承载形成有半导体膜层的基板；多个加热器，用于对半导体膜层各区域进行分别加热；载流子检测装置，用于检测半导体膜层各区域的载流子浓度；控制装置，控制装置分别与载流子检测装置和每个加热器连接，控制装置根据载流子检测装置所检测的半导体膜层各区域的载流子浓度，调整加热器对半导体膜层中对应区域进行加热的加热温度，使半导体膜层各区域的载流子浓度相同。本发明提供的膜层退火设备及退火方法应用于制作薄膜晶体管的有源层中。
摘要（英）：

The present disclosure provides a film annealing apparatus and method. The film annealing apparatus includes: a carrying platform configured to carry a substrate formed with a film layer thereon; a heater configured to individually heat respective regions of the film layer such that the film layer is annealed; a carrier detector configured to detect carrier concentrations of the respective regions of the film layer; and a controller electrically connected with the carrier detector and the heater respectively and configured to, according to the carrier concentrations of the respective regions of the film layer detected by the carrier detector, adjust at least one of a heating temperature and a heating time of the heater for heating a corresponding one of the regions of the film layer such that the carrier concentrations of the respective regions of the annealed film layer become the same.

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