The invention relates to a method for uniformly polishing an optical device. The method comprises the steps of 1, putting a planetary wheel into a polisher; 2, putting the optical device into a machining cavity, wherein the machining cavity is formed in a polishing hole of the planetary wheel and can freely rotate relative to the polishing hole; 3, starting polishing, wherein the planetary wheel rotates with a driving wheel of the polisher and has the rotation speed w1, the machining cavity rotates with the planetary wheel and the optical device and has the rotation speed w2, and w1 is not equal to w2. According to the technical scheme, in the polishing process, the grinding paths which all parts of the optical device pass by are basically the same.