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发明公开
CN107746188A 用于生产包括三元合金的低辐射玻璃的涂层系统、方法和装置 无效 - 撤回

用于生产包括三元合金的低辐射玻璃的涂层系统、方法和装置
摘要：
在此公开的系统、方法，和设备用于形成低辐射板，其可包括基片和反射层，被形成在所述基片上。所述低辐射板可进一步包括顶部介质层，被形成在所述反射层上，从而所述反射层被形成在所述顶部介质层和所述基片之间。所述顶部介质层可包括三元金属氧化物，如锌锡铝氧化物。所述顶部介质层也可包括铝。所述铝浓度的原子百分比为1％-15％，或为2％-10％。锌对锡的原子比可为0.67-1.5，或为0.9-1.1。
摘要（英）：

Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a substrate and a reflective layer formed over the substrate. The low emissivity panels may further include a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the top dielectric layer and the substrate. The top dielectric layer may include aternary metal oxide, such as zinc tin aluminum oxide. The top dielectric layer may also include aluminum. The concentration of aluminum may be between about 1 atomic% and 15 atomic% or between about 2atomic% and 10 atomic%. An atomic ratio of zinc to tin in the top dielectric layer may be between about 0.67 and about 1.5 or between about 0.9 and about 1.1.

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