利索-全球专利检索

  1. 登录
  2. 注册
发明公开
CN107916451A 一种铸造多晶硅免喷坩埚 有权 转让

一种铸造多晶硅免喷坩埚
摘要：
本发明公开一种铸造多晶硅免喷坩埚，该坩埚包含坩埚本体，所述坩埚本体的内表面上由内到外依次喷涂有第一层涂层、第二层涂层和第三层涂层；按质量百分含量计，第一层涂层的成分包括4.5￣95％的氮氧化硅，4.5￣95％的二氧化硅和0.5￣5％的硅溶胶；第二层涂层的成分包括5￣50％的氮氧化硅，0.5￣50％的二氧化硅，0.5￣50％的氮化硅，0.5￣5％的硅溶胶和0.5￣5％的PVA；第三层涂层的成分包括0.5￣95％的氮氧化硅，0.5￣95％的氮化硅，0.5￣5％的PVA和0.5￣5％的PAA；所述第二层涂层和第三层涂层中的氮化硅涂层包括两种粒径的氮化硅；所述的氮氧化硅采用特定方法制备。本发明的多晶硅铸锭免喷坩埚可减少氮化硅掉入硅液的风险，也增加其阻挡杂质和顺利脱模的效果。
摘要（英）：

The invention discloses a cast multi-crystalline silicon free-spraying crucible which comprises a crucible body. A first coating, a second coating and a third coating are sequentially sprayed onto theinner surface of the crucible body from inside to outside. The first coating comprises, in weight percent, 4.5-95% of silicon oxynitride, 4.5-95% of silicon dioxide and 0.5-5% of silica sol. The second coating comprises, in weight percent, 5-50% of silicon oxynitride, 0.5-50% of silicon dioxide, 0.5-50% of silicon nitride, 0.5-5% of silica sol and 0.5-5% of PVA (polyvinyl acetate). The third coating comprises, in weight percent, 0.5-95% of silicon oxynitride, 0.5-95% of silicon nitride, 0.5-5% of PVA and 0.5-5% of PAA (polyacrylic acid). Silicon nitride coatings in the second coating and thethird coating comprise silicon nitride with two particle sizes, and the silicon oxynitride is prepared by a specific method. According to the cast multi-crystalline silicon free-spraying crucible, therisk of falling of silicon nitride into silicon liquid can be decreased, and impurity stopping and smooth demolding effects are increased.

公开/授权文献
0/0