The invention relates to the technical field of semiconductor film deposition equipment, in particular to a gas flow separation and gathering device capable of introducing multiple process gas. The gas flow separation and gathering device comprises a flow gathering valve, flow separation valves and a cleaning valve; the flow gathering valve is provided with multiple intake ports and an exhaust port; one intake port is connected with the cleaning valve; and the rest intake ports are correspondingly connected with the flow separation valves. Intake and exhaust pipes, independent from each other,are arranged in the flow gathering valve, the flow separation valves and the cleaning valve. The gas flow separation and gathering device has the following advantages: the flow gathering valve, the flow separation valves and the cleaning valve are integrated, and meanwhile, realizes flow separation of process gas; the valves use direct welding for replacing VCR to obtain the shortest connecting distance to reduce the shortest gas stop time and stop space in valve bodies; and meanwhile, the device is provided with a heating substrate for effectively preventing condensation of liquid-state source gas in the valve bodies and pipelines.