The invention provides a measuring system for the gas adsorbing rate and the gas desorbing rate on the surface of a material and measuring method. The measuring system comprises a pressure control box, a gas pumping system, a gas-to-be-measured supplying system and a temperature-controllable QCM (Quartz Crystal Microbalance) measuring system, wherein the gas pumping system and the gas-to-be-measured supplying system are respectively communicated with the pressure control box by gas cabin-penetrating flanges; the temperature-controllable QCM supplying system comprises a QCM probe, a QCM signalprocessor and a cooling machine; a metal material to be measured is plated on a surface wafer in the QCM probe; the cooling machine is connected with the QCM probe by a cooling pipeline and is used for controlling the temperature of the surface wafer. By utilization of the measuring system, accurate measurement for gas adsorbing rate and the gas desorbing rate on the surface of the material underlow-temperature and low-pressure conditions can be realized; the measuring method utilizes the measuring system.