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发明公开
CN108172531A 刻蚀设备 有权

刻蚀设备
摘要：
本发明提供一种刻蚀设备，所述刻蚀设备包括密封罩、承载板、挡板、边框以及多个第一排气结构，所述承载板、挡板及边框位于所述密封罩内，所述边框和所述挡板设于所述承载板上，所述挡板位于所述边框的中间并与所述边框围合成两个收容部，所述两个收容部用于放置触摸面板，所述多个第一排气结构环绕所述边框设置，所述多个第一排气结构用于将密封罩中的空气排出。本发明提出的刻蚀设备包括多个第一排气结构，在干法刻蚀时，可以通过多个第一排气结构促进密封罩内的工艺气体的流动，使得工艺气体均匀分布在密封罩内，从而优化刻蚀环境、提高刻蚀均一性以及提升产品良率。
摘要（英）：

The invention provides etching equipment. The etching equipment comprises a sealing cover, a bearing plate, a baffle, a frame and a plurality of first ventilating structures; the bearing plate, the baffle and the frame are all positioned in the sealing cover; the frame and the baffle are arranged on the bearing plate; the baffle is positioned in the middle of the frame, and the baffle and the frame form two accommodating parts in a surrounding manner; the two accommodating parts are used for placing touch panels; the multiple first ventilating structures are arranged around the frame; and themultiple first ventilating structures are used for exhausting air from the sealing cover. The etching equipment provided by the invention comprises multiple first ventilating structures; and in dry etching, flowing of process gas in the sealing cover can be promoted through the multiple first ventilating structures, so that the process gas can be uniformly distributed in the sealing cover, therebyoptimizing the etching environment, improving etching uniformity and improving product yield.

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