利索-全球专利检索

  1. 登录
  2. 注册
发明公开
CN108351560A 制备柱状间隔物的方法 无效 - 驳回

制备柱状间隔物的方法
摘要：
本发明涉及一种制备柱状间隔物的方法，并且其特征在于使用包括具有不同透光率的第一、第二和第三图案的掩模。另外，根据本发明的用于制备柱状间隔物的方法，在制造基质部分和间隔物部分连续连接的柱状间隔物期间，所述基质部分与所述间隔物部分之间的锥角可以增加，并且所述间隔物部分的临界尺寸会减小。因此，可以简单且高效地制造具有精细图案的柱状间隔物。
摘要（英）：

The present invention relates to a method for preparing a column spacer, and is characterized in using a mask including first, second, and third patterns having different light transmittance. In addition, according to the method for preparing a column spacer of the present invention, a taper angle between a matrix part and a spacer part may increase during manufacturing a column spacer in which the matrix part and the spacer part are continuously connected, and critical dimension of the spacer part may decrease. Therefore, a column spacer with fine patterns may be simply and efficiently manufactured.

0/0