The invention relates to a self-support chiral nanometer hollow cone array thin film with a chiral optical rotation property, and a preparation method thereof, and belongs to the technical field of chiral materials. The invention relates to a masking etching method, a physical vapor deposition method, a colloid microballoon interface assembling method and a micro-nano structure liquid phase transfer method. In the whole process, operation is simple and convenient, low consumption and cleanliness are achieved, and controllability is high. Through combing colloid etching and controllable glancing angle deposition technologies, the large-area self-support chiral nanometer hollow cone array thin film with the chiral optical rotation property can be prepared. A chiral signal can be regulated through adjusting a microstructural shape of an array, and a provided chiral plasma cavity has important application value on chiral limitation detection. Through a film-forming property of the chiral array structure, the chiral array structure can be easily separated from an original substrate so as to form a self-support material, and materials such as flexible chiral materials with practicabilitycan be further prepared through the follow-up transfer operation.